{"id":5466,"date":"2026-05-07T14:39:25","date_gmt":"2026-05-07T06:39:25","guid":{"rendered":"https:\/\/whmicro.com\/?p=5466"},"modified":"2026-05-07T14:39:25","modified_gmt":"2026-05-07T06:39:25","slug":"multi-zone-baking-hot-plate-product-introduction","status":"publish","type":"post","link":"https:\/\/whmicro.com\/?p=5466","title":{"rendered":"Multi-Zone Baking Hot Plate Product Introduction"},"content":{"rendered":"

[vc_row rt_row_background_width=”default” rt_row_style=”default-style” rt_row_borders=”” rt_row_paddings=”true” rt_bg_effect=”classic” rt_bg_image_repeat=”repeat” rt_bg_size=”cover” rt_bg_position=”right top” rt_bg_attachment=”scroll” rt_bg_video_format=”self-hosted”][vc_column width=”4\/5″ rt_wrp_col_paddings=”false” rt_border_top=”” rt_border_bottom=”” rt_border_left=”” rt_border_right=”” rt_border_top_mobile=”” rt_border_bottom_mobile=”” rt_border_left_mobile=”” rt_border_right_mobile=”” rt_bg_image_repeat=”repeat” rt_bg_size=”auto auto” rt_bg_position=”right top” rt_bg_attachment=”scroll”][vc_column_text]<\/p>\n

High-efficiency Photolithography Baking Solution \u2014 WH-HP-02\/03 Multi-Zone Baking Hot Plate<\/h1>\n
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In micro-nano fabrication and photolithography processes, the temperature consistency and efficiency of photoresist baking (soft bake, intermediate bake, post bake) directly determine patterning quality and process repeatability. Conventional single-zone baking hot plates require frequent temperature rise and fall when multiple temperature setpoints are needed, which is time-consuming and prone to introducing process errors.<\/div>\n
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Launched by Hanyi Co., Ltd., the WH-HP-02 (7-inch) and WH-HP-03 (5-inch) multi-zone baking hot plates adopt an innovative three independent temperature zone control design, upgrading the laboratory photoresist baking experience.<\/div>\n
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Three Core Advantages<\/h2>\n
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1. Three Independently Controllable Zones, Greatly Improved Efficiency<\/h3>\n
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The equipment is equipped with three independent temperature control zones, which can be set to different temperatures and operated simultaneously or individually.<\/p>\n

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For instance, soft bake (90\u2103), intermediate bake (110\u2103) and post bake (120\u2103) can be performed at the same time without waiting for temperature switching. The single-batch processing time is reduced by over 50%. Each zone operates without mutual thermal interference, ensuring consistent process performance.<\/p>\n<\/div>\n

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2. Precise PID Temperature Control with Excellent Repeatability<\/h3>\n
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Adopting a PID closed-loop temperature control system, it achieves temperature control accuracy of \u00b11\u2103<\/strong> and temperature uniformity within \u00b15%<\/strong>. It features fast heating rate and high long-term operating stability. The touchscreen interface supports segmented programmable temperature profile setting, enabling easy configuration of complex baking procedures.<\/div>\n
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3. Compatible with Mainstream Spin Coaters for One-Stop Thin Film Preparation<\/h3>\n
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The WH-HP series hot plates are perfectly compatible with KW-4A and WH-SC-01 spin coaters, forming an ideal matching solution for the preparation of metal oxide thin films, polymer coatings and metal-organic thin films.<\/div>\n
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Compared with traditional drying ovens, the hot plate delivers uniform bottom-up heating to avoid the “skin effect”. It shortens baking time several times and produces denser and more uniform film layers.<\/div>\n
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Quick Overview of Technical Specifications<\/h2>\n
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\u8868\u683c<\/div>\n
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Model<\/th>\nApplicable Substrate<\/th>\nTemperature Range<\/th>\nPower<\/th>\nOverall Dimension<\/th>\nWeight<\/th>\n<\/tr>\n<\/thead>\n
WH-HP-02<\/td>\n\u03a6210 mm<\/td>\nRoom Temperature ~ 300\u2103<\/td>\n2.5 kW<\/td>\n580\u00d7706\u00d7187 mm<\/td>\n40 kg<\/td>\n<\/tr>\n
WH-HP-03<\/td>\n\u03a6130 mm<\/td>\nRoom Temperature ~ 300\u2103<\/td>\n1.5 kW<\/td>\n480\u00d7580\u00d7200 mm<\/td>\n21 kg<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<\/div>\n<\/div>\n
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Both models adopt AC220V power supply and touchscreen operation with built-in PID algorithm for stable continuous operation. The compact structure saves laboratory space, making it an ideal choice for research institutes, semiconductor manufacturers and university photolithography laboratories.<\/div>\n
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Typical Application Scenarios<\/h2>\n
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  • Photoresist soft bake, post bake and hard bake<\/li>\n
  • Heat treatment of sol-gel thin films<\/li>\n
  • Curing of polymer coatings<\/li>\n
  • Annealing of organometallic thin films<\/li>\n<\/ul>\n
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    Click to download the full manual and start a new experience of efficient and precise multi-zone photoresist baking.<\/div>\n
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    Note<\/strong>: All product parameters are sourced from public documents of Hanyi Co., Ltd. Model selection and application shall be determined according to actual process requirements.<\/div>\n

    [\/vc_column_text][\/vc_column][vc_column width=”1\/5″ rt_wrp_col_paddings=”false” rt_border_top=”” rt_border_bottom=”” rt_border_left=”” rt_border_right=”” rt_border_top_mobile=”” rt_border_bottom_mobile=”” rt_border_left_mobile=”” rt_border_right_mobile=”” rt_bg_image_repeat=”repeat” rt_bg_size=”auto auto” rt_bg_position=”right top” rt_bg_attachment=”scroll”][vc_widget_sidebar sidebar_id=”sidebar-for-portfolio”][\/vc_column][\/vc_row]<\/p>\n","protected":false},"excerpt":{"rendered":"

    [vc_row rt_row_background_width=”default” rt_row_style=”default-style” rt_row_borders=”” rt_row_paddings=”true” rt_bg_effect=”classic” rt_bg_image_repeat=”repeat” rt_bg_size=”cover” rt_bg_position=”right top” rt_bg_attachment=”scroll” rt_bg_video_format=”self-hosted”][vc_column width=”4\/5″ rt_wrp_col_paddings=”false” rt_border_top=”” rt_border_bottom=”” rt_border_left=”” rt_border_right=”” rt_border_top_mobile=”” rt_border_bottom_mobile=”” rt_border_left_mobile=”” rt_border_right_mobile=”” rt_bg_image_repeat=”repeat” rt_bg_size=”auto auto” rt_bg_position=”right top” rt_bg_attachment=”scroll”][vc_column_text] High-efficiency Photolithography Baking Solution \u2014 WH-HP-02\/03 Multi-Zone Baking Hot Plate In micro-nano fabrication and photolithography processes, the temperature consistency and efficiency of photoresist baking (soft bake, intermediate […]<\/p>\n","protected":false},"author":1,"featured_media":5467,"comment_status":"closed","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[1],"tags":[],"yoast_head":"\nMulti-Zone Baking Hot Plate Product Introduction - 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