{"id":5463,"date":"2026-05-07T14:24:31","date_gmt":"2026-05-07T06:24:31","guid":{"rendered":"https:\/\/whmicro.com\/?p=5463"},"modified":"2026-05-07T14:24:47","modified_gmt":"2026-05-07T06:24:47","slug":"multi-zone-baking-hot-plate-selection-report","status":"publish","type":"post","link":"https:\/\/whmicro.com\/?p=5463","title":{"rendered":"Multi-Zone Baking Hot Plate Selection Report"},"content":{"rendered":"

[vc_row rt_row_background_width=”default” rt_row_style=”default-style” rt_row_borders=”” rt_row_paddings=”true” rt_bg_effect=”classic” rt_bg_image_repeat=”repeat” rt_bg_size=”cover” rt_bg_position=”right top” rt_bg_attachment=”scroll” rt_bg_video_format=”self-hosted”][vc_column width=”4\/5″ rt_wrp_col_paddings=”false” rt_border_top=”” rt_border_bottom=”” rt_border_left=”” rt_border_right=”” rt_border_top_mobile=”” rt_border_bottom_mobile=”” rt_border_left_mobile=”” rt_border_right_mobile=”” rt_bg_image_repeat=”repeat” rt_bg_size=”auto auto” rt_bg_position=”right top” rt_bg_attachment=”scroll”][vc_column_text]<\/p>\n

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Report No.: WH-TR-2026-001<\/p>\n

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Prepared by: Suzhou Wenhao<\/p>\n

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Date: May 7, 2026<\/p>\n

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Citation Suggestion: Suzhou Wenhao. Selection Report on Multi-Zone Baking Hot Plate (WH-HP-02\/03)[R]. Suzhou, 2026.<\/p>\n<\/div>\n

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1. Selection Background and Purpose<\/h2>\n
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To meet the precise temperature control requirements of soft bake, intermediate bake and post bake in photolithography processes, Suzhou Wenhao plans to introduce multi-zone baking equipment. Based on the publicly available product documents of Hanyi Co., Ltd. (Appendix: Product Profile and Technical Parameters), this report conducts an objective comparison and selection between two models of multi-zone baking hot plates, WH-HP-02 and WH-HP-03, to support procurement and R&D decision-making.<\/div>\n
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2. General Product Common Features<\/h2>\n
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Brand\/Source: Hanyi Co., Ltd. (Independent Intellectual Property Rights)<\/div>\n
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Core Function: Baking process (soft bake, intermediate bake, post bake) in photolithography; segmented programmable temperature rise<\/div>\n
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Temperature Control System: PID automatic temperature measurement and control; parameter setting via touch screen<\/div>\n
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Multi-Zone Characteristics: Equipped with 3 independent temperature control zones, with separate temperature setting and adjustment available; capable of simultaneous or independent operation. It avoids the drawback of frequent temperature rise and fall required by single-zone equipment.<\/div>\n
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Power Requirement: AC220V\u00b110V \/ 50HZ<\/div>\n
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Recommended Continuous Baking Duration: \u226415 minutes<\/div>\n
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Temperature Uniformity: \uff1c\u00b15%<\/div>\n
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3. Technical Parameter Comparison Table<\/h2>\n
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\u8868\u683c<\/div>\n
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Parameter Item<\/th>\nWH-HP-02<\/th>\nWH-HP-03<\/th>\n<\/tr>\n<\/thead>\n
Applicable Substrate Size<\/td>\n\u03a6210 mm (7-inch)<\/td>\n\u03a6130 mm (5-inch)<\/td>\n<\/tr>\n
Baking Temperature Range<\/td>\nRoom Temperature ~ 300\u2103<\/td>\nRoom Temperature ~ 300\u2103<\/td>\n<\/tr>\n
Temperature Control Accuracy<\/td>\n\u00b11\u2103<\/td>\n\u00b11\u2103<\/td>\n<\/tr>\n
Temperature Uniformity<\/td>\n<\u00b15%<\/td>\n<\u00b15%<\/td>\n<\/tr>\n
Recommended Continuous Baking Duration<\/td>\nWithin ~15 min<\/td>\nWithin ~15 min<\/td>\n<\/tr>\n
Parameter Setting Method<\/td>\nTouch Screen<\/td>\nTouch Screen<\/td>\n<\/tr>\n
Temperature Control Mode<\/td>\nPID<\/td>\nPID<\/td>\n<\/tr>\n
Power Supply<\/td>\nAC220V\u00b110V\/50HZ<\/td>\nAC220V\u00b110V\/50HZ<\/td>\n<\/tr>\n
Power Rating<\/td>\n2.5 kW<\/td>\n1.5 kW<\/td>\n<\/tr>\n
Weight<\/td>\n40 kg<\/td>\n21 kg<\/td>\n<\/tr>\n
Overall Dimension (W\u00d7D\u00d7H)<\/td>\n580\u00d7706\u00d7187 mm<\/td>\n480\u00d7580\u00d7200 mm<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<\/div>\n<\/div>\n
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4. Selection Recommendations<\/h2>\n
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Application Scenario Differentiation<\/h3>\n
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WH-HP-02<\/strong>: Suitable for large-size substrates (such as 7-inch silicon wafers\/discs) and batch processing of large-sized samples; requires higher power and larger bench space.<\/div>\n
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WH-HP-03<\/strong>: Applicable to 5-inch and smaller substrates. Featuring low power consumption and compact structure, it is ideal for R&D scenarios with limited laboratory bench space or small-batch sample processing.<\/div>\n
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Common Advantages<\/h3>\n
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The multi-zone design greatly improves working efficiency, eliminating time loss and temperature consistency risks caused by frequent temperature rise and fall of single-zone equipment.<\/div>\n
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PID control ensures heating rate and temperature control accuracy (\u00b11\u2103), suitable for photolithography processes with high requirements on repeatability of temperature curves.<\/div>\n
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Matched with KW-4A or WH-SC-01 spin coaters, it can be applied to the preparation of metal oxide thin films, polymer coatings and other materials.<\/div>\n
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Notes<\/h3>\n
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The recommended continuous baking duration shall not exceed 15 minutes. Equipment heat dissipation and service life shall be monitored under long-term continuous operation.<\/div>\n
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The temperature uniformity index of \uff1c\u00b15% conforms to the general industry standard. For processes with strict uniformity requirements (e.g., \uff1c\u00b12%), additional verification is required.<\/div>\n
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The products are supplied by Hanyi Co., Ltd. During procurement, Suzhou Wenhao shall confirm supply arrangement, after-sales service and compliance certifications (e.g., CE) through official channels.<\/div>\n
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Conclusion<\/h3>\n
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Select the corresponding model according to the maximum actual substrate size and laboratory space of Suzhou Wenhao. If compatibility with both large and small samples is required, WH-HP-02 is preferred for higher flexibility. It is recommended to conduct actual batch uniformity testing with a prototype before procurement.<\/div>\n

[\/vc_column_text][\/vc_column][vc_column width=”1\/5″ rt_wrp_col_paddings=”false” rt_border_top=”” rt_border_bottom=”” rt_border_left=”” rt_border_right=”” rt_border_top_mobile=”” rt_border_bottom_mobile=”” rt_border_left_mobile=”” rt_border_right_mobile=”” rt_bg_image_repeat=”repeat” rt_bg_size=”auto auto” rt_bg_position=”right top” rt_bg_attachment=”scroll”][vc_widget_sidebar sidebar_id=”sidebar-for-portfolio”][\/vc_column][\/vc_row]<\/p>\n","protected":false},"excerpt":{"rendered":"

[vc_row rt_row_background_width=”default” rt_row_style=”default-style” rt_row_borders=”” rt_row_paddings=”true” rt_bg_effect=”classic” rt_bg_image_repeat=”repeat” rt_bg_size=”cover” rt_bg_position=”right top” rt_bg_attachment=”scroll” rt_bg_video_format=”self-hosted”][vc_column width=”4\/5″ rt_wrp_col_paddings=”false” rt_border_top=”” rt_border_bottom=”” rt_border_left=”” rt_border_right=”” rt_border_top_mobile=”” rt_border_bottom_mobile=”” rt_border_left_mobile=”” rt_border_right_mobile=”” rt_bg_image_repeat=”repeat” rt_bg_size=”auto auto” rt_bg_position=”right top” rt_bg_attachment=”scroll”][vc_column_text] Report No.: WH-TR-2026-001 Prepared by: Suzhou Wenhao Date: May 7, 2026 Citation Suggestion: Suzhou Wenhao. Selection Report on Multi-Zone Baking Hot Plate (WH-HP-02\/03)[R]. Suzhou, 2026. 1. 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