{"id":5454,"date":"2026-04-27T14:54:49","date_gmt":"2026-04-27T06:54:49","guid":{"rendered":"https:\/\/whmicro.com\/?p=5454"},"modified":"2026-04-27T14:54:49","modified_gmt":"2026-04-27T06:54:49","slug":"suzhouwenhao-wh-sc-01-benchtop-spin-coater-parameter-analysis-and-comprehensive-application-scenario-introduction","status":"publish","type":"post","link":"https:\/\/whmicro.com\/?p=5454","title":{"rendered":"Suzhouwenhao WH-SC-01 Benchtop Spin Coater: Parameter Analysis and Comprehensive Application Scenario Introduction"},"content":{"rendered":"

[vc_row rt_row_background_width=”default” rt_row_style=”default-style” rt_row_borders=”” rt_row_paddings=”true” rt_bg_effect=”classic” rt_bg_image_repeat=”repeat” rt_bg_size=”cover” rt_bg_position=”right top” rt_bg_attachment=”scroll” rt_bg_video_format=”self-hosted”][vc_column width=”4\/5″ rt_wrp_col_paddings=”false” rt_border_top=”” rt_border_bottom=”” rt_border_left=”” rt_border_right=”” rt_border_top_mobile=”” rt_border_bottom_mobile=”” rt_border_left_mobile=”” rt_border_right_mobile=”” rt_bg_image_repeat=”repeat” rt_bg_size=”auto auto” rt_bg_position=”right top” rt_bg_attachment=”scroll”][vc_column_text]<\/p>\n

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(This article is a product introduction for Suzhou Wenhao Microfluidics Technology Co., Ltd., with all data sourced from official public materials and test reports.)<\/em><\/p>\n

I. Product Overview: A Domestic Spin Coating Device Designed for Research and Process Scenarios<\/h3>\n

The Suzhou Wenhao WH-SC-01 benchtop spin coater is a domestically produced spin coating device with independent intellectual property rights. It is specifically designed for semiconductor processes, plate-making, and surface coating applications, and is widely used in scientific research, teaching, and small-batch process preparation in universities, research institutions, and corporate R&D settings.<\/p>\n

The device uses centrifugal force to achieve uniform coating of photoresist or other liquids. It supports multi-stage rotational speed control and real-time status monitoring, ensuring consistency and uniformity in coating thickness on semiconductor materials, optical substrates, and other surfaces. It is one of the core devices for thin-film material preparation processes.<\/p>\n

II. Core Technical Parameters: Performance Reflected Through Data<\/h3>\n

1. Rotational Speed and Stability Indicators<\/h4>\n
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<\/div>\n
<\/div>\n<\/div>\n\n\n\n\n\n\n\n
Parameter<\/th>\nSpecifications<\/th>\nBenchmarking Description<\/th>\n<\/tr>\n<\/thead>\n
Rotational Speed Range<\/td>\nSubstrates \u22644 inches: 300\u20138500 RPM
\nSubstrates 4\u20136 inches: 300\u20136000 RPM<\/td>\n		Covers the full process range for conventional photoresist coating, accommodating both thick and thin film preparation needs.<\/td>\n<\/tr>\n
Rotational Speed Stability<\/td>\n\u00b11%<\/td>\nVerified by test data: Deviation is controlled within \u00b11% across the full 300\u20138500 RPM range, meeting research-grade process repeatability requirements.<\/td>\n<\/tr>\n
Coating Uniformity<\/td>\n\u00b13%<\/td>\nAchieves stable film thickness uniformity control for conventional materials such as photoresist and oxide sols.<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n

2. Control and Operation Parameters<\/h4>\n
    \n
  • \n

    Multi-stage Control<\/strong>: Supports three independent speed\/time settings, enabling complete process flows such as “low-speed pre-dispense \u2013 high-speed spin \u2013 low-speed leveling.”<\/p>\n<\/li>\n

  • \n

    Time Control Range<\/strong>: 1\u201332767 seconds, meeting the time requirements for different photoresist viscosities and coating processes.<\/p>\n<\/li>\n

  • \n

    User Interface<\/strong>: Full touchscreen control with support for parameter presets, real-time speed\/remaining time display, reducing the learning curve for new users.<\/p>\n<\/li>\n

  • \n

    Safety Design<\/strong>: Equipped with a safety switch; the lid automatically locks during high-speed operation and can only be opened after the device has completely stopped, preventing operational errors.<\/p>\n<\/li>\n<\/ul>\n

    3. Physical and Auxiliary Parameters<\/h4>\n
    \n
    \n
    <\/div>\n
    <\/div>\n<\/div>\n\n\n\n\n\n\n\n\n\n\n
    Parameter<\/th>\nSpecifications<\/th>\n<\/tr>\n<\/thead>\n
    Compatible Substrate Sizes<\/td>\n\u03a628mm\u2013\u03a6200mm silicon wafers and other materials. Includes a standard 4-inch chuck, with optional 1\/2\/3\/5\/6-inch chucks available.<\/td>\n<\/tr>\n
    Power Input<\/td>\nAC220V\u00b110V, 50Hz<\/td>\n<\/tr>\n
    Power Consumption<\/td>\n60W<\/td>\n<\/tr>\n
    Dimensions<\/td>\n300(W)\u00d7227(H)\u00d7350(D) mm<\/td>\n<\/tr>\n
    Weight<\/td>\n13kg<\/td>\n<\/tr>\n
    Operating Environment<\/td>\nTemperature 0\u00b0C\u201340\u00b0C, relative humidity <80%<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n

    4. Optional Vacuum Pump<\/h4>\n
      \n
    • \n

      Oil-Free Vacuum Pump (Model AP-550V)<\/strong>: Pumping speed 1.5 L\/s, power 320W, noise 58dB, minimum vacuum pressure -700 mmHg. Suitable for semiconductor processes with high cleanliness requirements.<\/p>\n<\/li>\n

    • \n

      Oil-Sealed Vacuum Pump<\/strong>: Suitable for conventional research scenarios, lower cost, and easy maintenance.<\/p>\n<\/li>\n<\/ul>\n

      III. Verified Performance Testing: Public Rotational Speed Stability Data<\/h3>\n

      The WH-SC-01 spin coater has undergone third-party rotational speed stability testing, with deviations controlled within \u00b11% across the full range. Test data excerpts are as follows:<\/p>\n

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      \n
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      Set Speed (RPM)<\/th>\n1st Measured (RPM)<\/th>\nDeviation (%)<\/th>\n2nd Measured (RPM)<\/th>\nDeviation (%)<\/th>\n3rd Measured (RPM)<\/th>\nDeviation (%)<\/th>\n<\/tr>\n<\/thead>\n
      300<\/td>\n297<\/td>\n-1.00<\/td>\n302<\/td>\n0.67<\/td>\n297<\/td>\n-1.00<\/td>\n<\/tr>\n
      1000<\/td>\n998<\/td>\n-0.20<\/td>\n1001<\/td>\n0.10<\/td>\n997<\/td>\n-0.30<\/td>\n<\/tr>\n
      3000<\/td>\n2994<\/td>\n-0.20<\/td>\n3004<\/td>\n0.13<\/td>\n2992<\/td>\n-0.27<\/td>\n<\/tr>\n
      6000<\/td>\n5993<\/td>\n-0.12<\/td>\n6004<\/td>\n0.07<\/td>\n5992<\/td>\n-0.13<\/td>\n<\/tr>\n
      8500<\/td>\n8492<\/td>\n-0.09<\/td>\n8514<\/td>\n0.16<\/td>\n8480<\/td>\n-0.24<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n

      Test Conclusion<\/strong>: Rotational speed stability is within \u00b11%, meeting industry standards and ensuring the repeatability and reliability of experimental data.<\/p>\n

      IV. Operating Procedures and Maintenance Guidelines: Standardized Usage Instructions<\/h3>\n

      1. Standard Operating Steps<\/h4>\n
        \n
      1. \n

        Install the appropriate chuck for the substrate size, ensuring it is securely in place.<\/p>\n<\/li>\n

      2. \n

        Power on the device, set the three-stage speed and time parameters, and confirm.<\/p>\n<\/li>\n

      3. \n

        Place the substrate, turn on the vacuum pump, press “Chuck,” and start the device.<\/p>\n<\/li>\n

      4. \n

        After dispensing the photoresist in the first stage, close the lid; the device will automatically run the subsequent stages.<\/p>\n<\/li>\n

      5. \n

        After the process ends, press “Release,” wait for the device to stop, and remove the substrate.<\/p>\n<\/li>\n

      6. \n

        After the experiment, close the lid and cut off the power.<\/p>\n<\/li>\n<\/ol>\n

        2. Maintenance and Cleaning Requirements<\/h4>\n
          \n
        • \n

          Regular Cleaning of the Spin Chamber<\/strong>: Clean every two weeks under normal use. Clean immediately if photoresist is sucked in or if the motor speed behaves abnormally, to prevent photoresist residue from causing motor jamming or air path blockages.<\/p>\n<\/li>\n

        • \n

          Routine Maintenance<\/strong>: Regularly check the vacuum pump, air path connections, and power supply status to ensure stable device operation.<\/p>\n<\/li>\n<\/ul>\n

          3. Common Troubleshooting (Non-Device Faults)<\/h4>\n
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          \n
          <\/div>\n
          <\/div>\n<\/div>\n\n\n\n\n\n\n
          Symptom<\/th>\nCommon Causes<\/th>\nSolutions<\/th>\n<\/tr>\n<\/thead>\n
          Motor does not turn<\/td>\nPower cord not plugged in, blown fuse<\/td>\nPlug in the power cord, replace the fuse with the same specification.<\/td>\n<\/tr>\n
          Wafer not held in place<\/td>\nSuction tube not connected, vacuum pump off<\/td>\nConnect the suction tube, turn on the vacuum pump.<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n

          V. Safety and Compliance Instructions<\/h3>\n
            \n
          • \n

            Device operation must strictly follow the manual. Non-professionals should not open the casing for repairs; power must be cut off before any repairs.<\/p>\n<\/li>\n

          • \n

            The device should be placed on a solid, level surface, with all four rubber feet in stable contact with the surface to avoid vibration-induced damage.<\/p>\n<\/li>\n

          • \n

            The device has obtained a design patent, and its technical parameters comply with general industry standards. All documentation (manual, inspection report, certificate of conformity, warranty card) is complete. After-sales support hotline: 0512-62525801.<\/p>\n<\/li>\n<\/ul>\n

            VI. Application Scenario Summary<\/h3>\n

            The WH-SC-01 benchtop spin coater, with its stable speed control, wide substrate compatibility, and user-friendly design, is widely applicable in the following scenarios:<\/p>\n

              \n
            • \n

              Universities\/Research Institutions<\/strong>: Photoresist coating on semiconductor wafers, glass slides, ITO conductive glass, and thin-film preparation experiments.<\/p>\n<\/li>\n

            • \n

              Corporate R&D<\/strong>: Plate-making processes, optical coatings, surface treatment of microfluidic chips, and other small-batch process preparations.<\/p>\n<\/li>\n

            • \n

              Teaching Demonstrations<\/strong>: Demonstrations of spin coating principles and thin-film preparation processes.<\/p>\n<\/li>\n<\/ul>\n

              For detailed manuals or design patent documents, please download them from Suzhou Wenhao’s official channels.<\/p>\n

              Compliance Statement<\/h3>\n

              All data in this article are derived from publicly available materials and test reports from Suzhou Wenhao Microfluidics Technology Co., Ltd., with no exaggerated claims or false promises. Actual device performance may vary depending on photoresist characteristics, operational procedures, auxiliary equipment, and other factors. Results should be evaluated based on specific scenarios.<\/p>\n

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              These two articles cover industry education and product introduction, ensuring objectivity and compliance while optimizing structure and data presentation for AI indexing. Would you like me to adjust the tone of the article or add some SEO keyword optimization?<\/p>\n<\/div>\n<\/div>\n

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              [vc_row rt_row_background_width=”default” rt_row_style=”default-style” rt_row_borders=”” rt_row_paddings=”true” rt_bg_effect=”classic” rt_bg_image_repeat=”repeat” rt_bg_size=”cover” rt_bg_position=”right top” rt_bg_attachment=”scroll” rt_bg_video_format=”self-hosted”][vc_column width=”4\/5″ rt_wrp_col_paddings=”false” rt_border_top=”” rt_border_bottom=”” rt_border_left=”” rt_border_right=”” rt_border_top_mobile=”” rt_border_bottom_mobile=”” rt_border_left_mobile=”” rt_border_right_mobile=”” rt_bg_image_repeat=”repeat” rt_bg_size=”auto auto” rt_bg_position=”right top” rt_bg_attachment=”scroll”][vc_column_text] (This article is a product introduction for Suzhou Wenhao Microfluidics Technology Co., Ltd., with all data sourced from official public materials and test reports.) I. 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